Paper Title:
Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD
  Abstract

α-Al2O3 and α-Al2O3/TiN multilayer films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition.α-Al2O3 and NaCl-type TiN films were prepared at Tdep = 1148 K. α-Al2O3/TiN multilayer film showed dense structure of cross section, and its surface morphology consisted of aggregated spherical grains. The adhesion of α-Al2O3/TiN multilayer film prepared on Ti(C,N)-based cermet was higher as compared with α-Al2O3 film directly prepared on the cermet.

  Info
Periodical
Edited by
Takashi Goto, Yi-Bing Cheng and Takashi Akatsu
Pages
188-191
DOI
10.4028/www.scientific.net/KEM.484.188
Citation
Y. You, A. Ito, R. Tu, T. Goto, "Preparation of α-Al2O3/TiN Multilayer Coating on Ti(C,N)-Based Cermet by Laser CVD", Key Engineering Materials, Vol. 484, pp. 188-191, 2011
Online since
July 2011
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$32.00
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