Paper Title:
Influence of Schottky Interfaces on Dielectric Properties in Perovskite-Type Oxide Thin-Film Capacitors
  Abstract

An estimation method of the influence of interfaces on properties in perovskite-type oxide thin-film capacitors is presented. We proposed a modified Schottky model that can be employed to explain the electric properties of metal/perovskite-type oxide junctions. The modified model considers the electric field dependence of permittivity and the flow of electrons from metal to defect states located in the band gap of the perovskite oxide. The simulation based on this model could successfully describe the results of capacitance-voltage measurements of junctions between metals (Pt, Au, and Ag) and Nb-doped SrTiO3, which were not explained by the conventional Schottky model. Additionally, a simulation for a thin-film capacitor with hysteretic behavior could depict an asymmetric capacitance-voltage curve.

  Info
Periodical
Edited by
Chazono Hirokazu, Fujihara Shinobu, Katayama Keiichi, Masumoto Hiroshi, Mizoguchi Teruyasu, Osada Minoru, Shinozaki Kazuo and Takeda Hiroaki
Pages
203-206
DOI
10.4028/www.scientific.net/KEM.485.203
Citation
N. Horiuchi, T. Hoshina, H. Takeda, T. Tsurumi, "Influence of Schottky Interfaces on Dielectric Properties in Perovskite-Type Oxide Thin-Film Capacitors", Key Engineering Materials, Vol. 485, pp. 203-206, 2011
Online since
July 2011
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