Paper Title:
Fabrication and Evaluation of Al2O3 Films Using the Aerosol Deposition Method
  Abstract

Equipment was designed for the application of Al2O3 thin films by the aerosol deposition method (ADM) at room temperature. Al2O3 film could be deposited on Pyrex-glass, indium tin oxide (ITO), polyvinyl chloride (PVC) plastic, single crystal silicon, and sapphire substrates. The films had the same crystal structure as the raw material particles and were highly transparent. The breakdown electric field of the Al2O3 film for the ADM was more than 35 kV/mm.

  Info
Periodical
Edited by
Chazono Hirokazu, Fujihara Shinobu, Katayama Keiichi, Masumoto Hiroshi, Mizoguchi Teruyasu, Osada Minoru, Shinozaki Kazuo and Takeda Hiroaki
Pages
211-214
DOI
10.4028/www.scientific.net/KEM.485.211
Citation
Y. Uemichi, K. Nishikawa, Y. Sato, S. Yoshikado, "Fabrication and Evaluation of Al2O3 Films Using the Aerosol Deposition Method", Key Engineering Materials, Vol. 485, pp. 211-214, 2011
Online since
July 2011
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Price
$32.00
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