Paper Title:
Magnetic Properties of Epitaxial NiFe2O4 Thin Films Prepared Using Dynamic Aurora PLD in a Magnetic Field
  Abstract

This study examined effects of applying a magnetic field (up to 2 kG) on the magnetic properties of epitaxial NiFe2O4 (NF) thin films during deposition. The NF films were deposited on Y0.15Zr0.85O1.93 (YSZ) buffered Si (001) substrates using pulsed laser deposition (PLD). Although application of magnetic field during deposition affected neither the crystal structure nor orientation of the NF thin films, it improved magnetic properties. The saturation magnetization (Ms) of NF thin films deposited at 500°C and 600°C without application of a magnetic field was as low as 40 emu/g. However, that of NF deposited under magnetic field of 2 kG got to bulk Ms (50.3 emu/g). The TEM observation results revealed that the anti-phase boundary (APB) density decreased by application of the magnetic field during deposition. Results show that magnetic properties of NF thin films are controllable using the magnetic field during deposition.

  Info
Periodical
Edited by
Chazono Hirokazu, Fujihara Shinobu, Katayama Keiichi, Masumoto Hiroshi, Mizoguchi Teruyasu, Osada Minoru, Shinozaki Kazuo and Takeda Hiroaki
Pages
221-224
DOI
10.4028/www.scientific.net/KEM.485.221
Citation
T. Kubo, N. Sakamoto, K. Shinozaki, H. Suzuki, N. Wakiya, "Magnetic Properties of Epitaxial NiFe2O4 Thin Films Prepared Using Dynamic Aurora PLD in a Magnetic Field", Key Engineering Materials, Vol. 485, pp. 221-224, 2011
Online since
July 2011
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