Paper Title:
Preparation of Si-C-N-O Amorphous Films from a Polysilazane by Heat Treatment at High-Temperatures
  Abstract

Si-C-N-O amorphous films were fabricated at about 800°C by pyrolysis of poly- vinylsilazane precursor films in a vacuum oven under N2 flow. The polymer precursor films were prepared onto Si wafers by spinning from a solution of the polymer. The compositions of the as-prepared films were confirmed by X-ray diffraction, Fourier transformation infrared spectroscopy, and x-ray photoelectron spectroscopy. SEM analysis indicated that the films can be formed with thickness more than several micrometers, and very smooth surfaces. Such films will be promising in application of protecting equipments in high-temperature, corrosive and wear environments.

  Info
Periodical
Edited by
Yiwang Bao, Danyu Jiang, Li Tian and Jianghong Gong
Pages
151-154
DOI
10.4028/www.scientific.net/KEM.492.151
Citation
G. L. Hou, Z. J. Peng, Z. Q. Fu, W. Yue, C. B. Wang, "Preparation of Si-C-N-O Amorphous Films from a Polysilazane by Heat Treatment at High-Temperatures", Key Engineering Materials, Vol. 492, pp. 151-154, 2012
Online since
September 2011
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