Paper Title:
Application of Argon Ion Beam Cross Section Polishing in Material Microstructure Research
  Abstract

Scanning Electron Microscope (SEM) has been widely used in the observation of surface and cross section of materials. So it is important to prepare the cross section of various specimens. In this study, a novel cross section preparation method using argon ion beam (called argon ion beam cross-section polisher or CP) was introduced. This method can not only overcome the problem of artifacts caused by mechanical polishing on the polished surface, but also enable one to prepare a wider area of specimens than the Focused Ion Beam (FIB) method. The soft materials, composite materials with different hardness, multilayer films and powders were all easily polished with few artifacts using this method.

  Info
Periodical
Edited by
Yiwang Bao, Danyu Jiang, Li Tian and Jianghong Gong
Pages
419-423
DOI
10.4028/www.scientific.net/KEM.492.419
Citation
Y. Z. Wang, W. Wu, Z. W. Liu, Y. Zeng, M. J. Ding, C. G. Zhang, "Application of Argon Ion Beam Cross Section Polishing in Material Microstructure Research", Key Engineering Materials, Vol. 492, pp. 419-423, 2012
Online since
September 2011
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Price
$32.00
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