Paper Title:
Studies of Hydroxyapatite Thin Coating Produced by Dual RF Magnetron Sputtering for Biomedical Applications
  Abstract

In this present work, we characterize HAp thin films deposited by dual magnetron sputtering device DMS on silicon (Si/HAp). The sputtering RF power was varied from 90 watts to 120 watts and deposition times from 60 to 180 minutes. The argon and oxygen pressure were fixed at 5.0 mTorr and 1.0 mTorr, respectively. Grazing incidence X-ray diffraction (GIXRD) from synchrotron radiation, infrared spectroscopy (FTIR) and atomic force microscopy (AFM) were used for the structural characterization. At lower deposition times, a crystalline phase with preferential orientation along apatite (002) and a disordered nanocrystalline phase were identified. The coating crystallinity was improved with the increase of the deposition time besides the sputtering power.

  Info
Periodical
Key Engineering Materials (Volumes 493-494)
Main Theme
Edited by
Eyup Sabri Kayali, Gultekin Goller and Ipek Akin
Pages
473-476
DOI
10.4028/www.scientific.net/KEM.493-494.473
Citation
E.O. Lopez, F.F. Borghi, A. Mello, J. Gomes, A. M. Rossi, "Studies of Hydroxyapatite Thin Coating Produced by Dual RF Magnetron Sputtering for Biomedical Applications", Key Engineering Materials, Vols. 493-494, pp. 473-476, 2012
Online since
October 2011
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