Paper Title:
Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications
  Abstract

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4 thin films on SiO2 and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4 thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.

  Info
Periodical
Edited by
E. Hristoforou and D.S. Vlachos
Pages
108-111
DOI
10.4028/www.scientific.net/KEM.495.108
Citation
V. P. Tsikourkitoudi, E. P. Koumoulos, N. Papadopoulos, C. A. Charitidis, "Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications", Key Engineering Materials, Vol. 495, pp. 108-111, 2012
Online since
November 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Sheng Zhao Wang, Dan Zhang, Ying Peng Yin, Ming Ji Shi, Da Yong Huang, Jia Hui Yu
V. Related Materials
Abstract:By PECVD deposition technology, we mainly investigated the influence of PRF (radio frequency power) on glass/steel-based intrinsic...
426
Authors: C.L. Zhong, P.A. Wei, L.E. Luo
Chapter 1: Material Engineering and its Application Technology
Abstract:A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin...
93
Authors: Xiao Hua Sun, Shuang Hou, Zhi Meng Luo, Cai Hua Huang, Zong Zhi Hu
Chapter 1: Engineering Science for Manufacturing
Abstract:Bismuth zinc niobate titanium (Bi1.5Zn0.5 Nb0.5Ti1.5O7) (BZNT) thin films were deposited on PtTiSiO2Si substrates by radio frequency (rf)...
211
Authors: Jaroslav Menčík
II. Mechanics of Contact
Abstract:The paper gives a brief overview of various energy approaches and possibilities they offer. Most of it is illustrated on examples from...
61