Paper Title:
Advanced Process for SiO2 Film Deposition in Aqueous Solution
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 53-55)
Edited by
P.J. Darragh and R.J. Stead
Pages
474-479
DOI
10.4028/www.scientific.net/KEM.53-55.474
Citation
Y. Sakai, T. Goda, A. Hishinuma, H. Kawahara, "Advanced Process for SiO2 Film Deposition in Aqueous Solution", Key Engineering Materials, Vols. 53-55, pp. 474-479, 1991
Online since
January 1991
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Price
$32.00
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