Tungsten Silicide Films Prepared by Excimer Laser Rapid Quenching |
| Journal |
Key Engineering Materials (Volumes 81 - 83) |
| Volume |
Amorphous Metallic Materials III |
| Edited by |
P. Duhaj, P. Mrafko and P. Svec |
| Pages |
291-296 |
| DOI |
10.4028/www.scientific.net/KEM.81-83.291 |
| Citation |
E. D'Anna et al., 1993, Key Engineering Materials, 81-83, 291 |
| Authors |
E. D'Anna, G. Leggieri, M. Luches, M. Martino, S. Luby, E. Majková, V. Bohác, V. Daniska |
| Keywords |
Laser Quenching, Tungsten Silicides, W/Si Interface |
| Full Paper |
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