SiO2 Doped Si3N4 Ceramics |
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| Journal | Key Engineering Materials (Volumes 89 - 91) |
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| Volume | Silicon Nitride '93 |
| Edited by | Michael J. Hoffmann, Paul F. Becher and Günther Petzow |
| Pages | 225-228 |
| DOI | 10.4028/www.scientific.net/KEM.89-91.225 |
| Citation | T. Takashashi et al., 1993, Key Engineering Materials, 89-91, 225 |
| Authors | T. Takashashi, M. Isomura, Y. Endoh, Y. Furuse |
| Keywords | High Temperature Properties, SiC Particle Dispersion, SiO2 |
| Full Paper | 
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