Paper Title:
Enhanced Oxygen Diffusion in Silicon at Thermal Donor Formation Temperature
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 10-12)
Edited by
H.J. von Bardeleben
Pages
1021-1026
DOI
10.4028/www.scientific.net/MSF.10-12.1021
Citation
S.T. Lee, P. Fellinger, "Enhanced Oxygen Diffusion in Silicon at Thermal Donor Formation Temperature", Materials Science Forum, Vols. 10-12, pp. 1021-1026, 1986
Online since
January 1986
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Price
$32.00
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