Paper Title:
Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 102-104)
Edited by
E.J. Mittemeijer
Pages
563-572
DOI
10.4028/www.scientific.net/MSF.102-104.563
Citation
S.L. Rohde, "Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes ", Materials Science Forum, Vols. 102-104, pp. 563-572, 1992
Online since
January 1992
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