Measurement of Interstitial Oxygen Striations in Silicon Single Crystals Using the Micro-FTIR Method
| Periodical | Materials Science Forum (Volumes 117 - 118) |
|---|---|
| Main Theme | Shallow Impurities in Semiconductors V |
| Edited by | Tsunemasa Taguchi |
| Pages | 189-194 |
| DOI | 10.4028/www.scientific.net/MSF.117-118.189 |
| Citation | E. Iino et al., 1993, Materials Science Forum, 117-118, 189 |
| Authors | E. Iino, I. Fusegawa, H. Yamagishi |
| Keywords | Czochralski Silicon, Micro-FTIR, Oxygen, Striations |
| Price | US$ 28,- |