Characterization of Impurities in Si(C2H5O)4 for Efficient SiO2 Production in ULSI Technology |
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| Journal | Materials Science Forum (Volumes 117 - 118) |
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| Volume | Shallow Impurities in Semiconductors V |
| Edited by | Tsunemasa Taguchi |
| Pages | 527-0 |
| DOI | 10.4028/www.scientific.net/MSF.117-118.527 |
| Citation | T. Danno et al., 1993, Materials Science Forum, 117-118, 527 |
| Authors | T. Danno, K. Seki |
| Keywords | SiO2, TEOS |
| Full Paper | 
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