Effect of External Pressure and Internal Stress on Imyurity Diffusion in Silicon |
|
| Journal | Materials Science Forum (Volumes 117 - 118) |
|---|---|
| Volume | Shallow Impurities in Semiconductors V |
| Edited by | Tsunemasa Taguchi |
| Pages | 75-80 |
| DOI | 10.4028/www.scientific.net/MSF.117-118.75 |
| Authors | O. Sugino, Atsushi Oshiyama |
| Keywords | Impurity Diffusion, Pressure |
| Full Paper | 
Get the full paper by clicking here
|