Paper Title:
Nucleation and Grain Growth in Silicon Films Deposited by Thermal Decomposition of Disilane
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 126-128)
Edited by
Ph. Komninou and A. Rocher
Pages
431-434
DOI
10.4028/www.scientific.net/MSF.126-128.431
Citation
A.T. Voutsas, M.K. Hatalis, "Nucleation and Grain Growth in Silicon Films Deposited by Thermal Decomposition of Disilane", Materials Science Forum, Vols. 126-128, pp. 431-434, 1993
Online since
January 1993
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Price
$32.00
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