PECVD of Silicon Dioxide from TEOS/Oxygen Mixtures |
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| Journal | Materials Science Forum (Volumes 140 - 142) |
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| Volume | Plasma Properties, Deposition and Etching |
| Edited by | J. J. Pouch and S. A. Alterovitz |
| Pages | 1-16 |
| DOI | 10.4028/www.scientific.net/MSF.140-142.1 |
| Citation | T.S. Cale et al., 1993, Materials Science Forum, 140-142, 1 |
| Authors | T.S. Cale, G.B. Raupp |
| Full Paper | 
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