Ion Energy Distributions and Sidewall Profiles in Reactive Ion Etching |
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| Journal | Materials Science Forum (Volumes 140 - 142) |
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| Volume | Plasma Properties, Deposition and Etching |
| Edited by | J. J. Pouch and S. A. Alterovitz |
| Pages | 121-132 |
| DOI | 10.4028/www.scientific.net/MSF.140-142.121 |
| Citation | Paul W. May et al., 1993, Materials Science Forum, 140-142, 121 |
| Authors | Paul W. May, David P. Field, D.F. Klemperer, Y.P. Song |
| Full Paper | 
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