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Analysis and Design of Plasma Chemical Reactions Based on Quantum Chemical Methods

Journal Materials Science Forum (Volumes 140 - 142)
Volume Plasma Properties, Deposition and Etching
Edited by J. J. Pouch and S. A. Alterovitz
Pages 17-24
DOI 10.4028/www.scientific.net/MSF.140-142.17
Citation K. Sato, 1993, Materials Science Forum, 140-142, 17
Authors K. Sato
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