Paper Title:
Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect
  Abstract

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Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
235-254
DOI
10.4028/www.scientific.net/MSF.140-142.235
Citation
M. Haverlag, A. Kono, G.M.W. Kroesen, F.J. de Hoog, "Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect", Materials Science Forum, Vols. 140-142, pp. 235-254, 1993
Online since
October 1993
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