Negatively Charged Particles in Fluorocarbon RF Etch Plasmas: Density Measurements Using Microwave Resonance and the Photodetachment Effect |
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| Journal | Materials Science Forum (Volumes 140 - 142) |
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| Volume | Plasma Properties, Deposition and Etching |
| Edited by | J. J. Pouch and S. A. Alterovitz |
| Pages | 235-254 |
| DOI | 10.4028/www.scientific.net/MSF.140-142.235 |
| Citation | M. Haverlag et al., 1993, Materials Science Forum, 140-142, 235 |
| Authors | M. Haverlag, Akihiro Kono, G.M.W. Kroesen, F.J. de Hoog |
| Full Paper | 
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