Paper Title:
Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
255-268
DOI
10.4028/www.scientific.net/MSF.140-142.255
Citation
P. Shufflebotham, M. Weise, D. Pirkle, D. Denison, "Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films", Materials Science Forum, Vols. 140-142, pp. 255-268, 1993
Online since
October 1993
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