Paper Title:
Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
285-300
DOI
10.4028/www.scientific.net/MSF.140-142.285
Citation
M. Shokrani, V.J. Kapoor, "Plasma Enhanced Chemical Vapor Deposited Silicon and Silicon Dioxide Films for Indium Phosphide MISFET Technology", Materials Science Forum, Vols. 140-142, pp. 285-300, 1993
Online since
October 1993
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Price
$32.00
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