Paper Title:
Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD
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Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
301-318
DOI
10.4028/www.scientific.net/MSF.140-142.301
Citation
J. Vuillod, "Physical and Electrical Properties of Silicon Nitride and Oxynitride Films Prepared by Plasma Enhanced CVD", Materials Science Forum, Vols. 140-142, pp. 301-318, 1993
Online since
October 1993
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Price
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