Paper Title:
Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures
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Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
319-334
DOI
10.4028/www.scientific.net/MSF.140-142.319
Citation
C. Gómez-Aleixandre, O. Sanchez, J.M. Albella, "Preparation and Properties of PECVD Silicon Nitride Films from SiH4 + NH3 and/or NF3 and SiF4+ NH3 Gas Mixtures", Materials Science Forum, Vols. 140-142, pp. 319-334, 1993
Online since
October 1993
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Price
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