Paper Title:
Anisotropic ECR Plasma Etching with Low-Energy Ions
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 140-142)
Edited by
J. J. Pouch and S. A. Alterovitz
Pages
39-54
DOI
10.4028/www.scientific.net/MSF.140-142.39
Citation
Y. Tobinaga, T. Miyano, K. Fujimoto, M. Fujito, H. Fujiwara, "Anisotropic ECR Plasma Etching with Low-Energy Ions", Materials Science Forum, Vols. 140-142, pp. 39-54, 1993
Online since
October 1993
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Price
$32.00
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