Anisotropic ECR Plasma Etching with Low-Energy Ions |
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| Journal | Materials Science Forum (Volumes 140 - 142) |
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| Volume | Plasma Properties, Deposition and Etching |
| Edited by | J. J. Pouch and S. A. Alterovitz |
| Pages | 39-54 |
| DOI | 10.4028/www.scientific.net/MSF.140-142.39 |
| Citation | Y. Tobinaga et al., 1993, Materials Science Forum, 140-142, 39 |
| Authors | Y. Tobinaga, T. Miyano, K. Fujimoto, M. Fujito, H. Fujiwara |
| Full Paper | 
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