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Study of Dry Development in Terms of Resist and Development Method

Journal Materials Science Forum (Volumes 140 - 142)
Volume Plasma Properties, Deposition and Etching
Edited by J. J. Pouch and S. A. Alterovitz
Pages 727-0
DOI 10.4028/www.scientific.net/MSF.140-142.727
Citation N. Abe et al., 1993, Materials Science Forum, 140-142, 727
Authors N. Abe, T. Motoyama
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