Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition |
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| Journal | Materials Science Forum (Volumes 148 - 149) |
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| Volume | Hydrogen in Compound Semiconductors |
| Edited by | S.J. Pearton |
| Pages | 61-112 |
| DOI | 10.4028/www.scientific.net/MSF.148-149.61 |
| Authors | A. Feingold, A. Katz |
| Keywords | Hydrogen, InP, RTOVD, SiO2, Titanium Nitride TiN, WSix, Zn |
| Full Paper | 
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