Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition |
| Journal |
Materials Science Forum (Volumes 148 - 149) |
| Volume |
Hydrogen in Compound Semiconductors |
| Edited by |
S.J. Pearton |
| Pages |
61-112 |
| DOI |
10.4028/www.scientific.net/MSF.148-149.61 |
| Citation |
A. Feingold et al., 1993, Materials Science Forum, 148-149, 61 |
| Authors |
A. Feingold, A. Katz |
| Keywords |
Hydrogen, InP, RTOVD, SiO2, Titanium Nitride TiN, WSix, Zn |
| Full Paper |
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