Paper Title:
Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition
  Abstract

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Periodical
Materials Science Forum (Volumes 148-149)
Edited by
S.J. Pearton
Pages
61-112
DOI
10.4028/www.scientific.net/MSF.148-149.61
Citation
A. Feingold, A. Katz, "Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition", Materials Science Forum, Vols. 148-149, pp. 61-112, 1994
Online since
December 1993
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