Silicides Thin Films Formed by Metal/Silicon Reaction: Role of Diffusion |
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| Journal | Materials Science Forum (Volumes 155 - 156) |
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| Volume | Reactive Phase Formation at Interfaces and Diffusion Processes |
| Edited by | Y. Limoge and J.L. Bocquet |
| Pages | 39-54 |
| DOI | 10.4028/www.scientific.net/MSF.155-156.39 |
| Authors | Patrick Gas |
| Keywords | Grain Boundary Diffusion, Kinetics of Formation, M/Si Solid State Reaction, Self-Diffusion, Silicide, Thin Film |
| Full Paper | 
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