Paper Title:
The Application of High Resolution X-Ray Diffraction for the Investigation of the Process of Elastic Strain Relaxation in InGaAs Quantum Well
  Abstract

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Periodical
Materials Science Forum (Volumes 166-169)
Edited by
R. Delhez and E.J. Mittemeijer
Pages
293-298
DOI
10.4028/www.scientific.net/MSF.166-169.293
Citation
N. Faleev, R. Stabenow, M. Sinitsyn, B. Yavich, A. Haase, A. Grudsky, "The Application of High Resolution X-Ray Diffraction for the Investigation of the Process of Elastic Strain Relaxation in InGaAs Quantum Well", Materials Science Forum, Vols. 166-169, pp. 293-298, 1994
Online since
July 1994
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Price
$32.00
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