Paper Title:
X-Ray Diffraction Studies and Ellipsometric Diagnostics of Thin α-Ti Growth Films in Plasma Activated Physical Vapour Deposition
  Abstract

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Periodical
Materials Science Forum (Volumes 166-169)
Edited by
R. Delhez and E.J. Mittemeijer
Pages
313-318
DOI
10.4028/www.scientific.net/MSF.166-169.313
Citation
H. Wulff, H. Steffen, V. Krasemann, J. Klimke, "X-Ray Diffraction Studies and Ellipsometric Diagnostics of Thin α-Ti Growth Films in Plasma Activated Physical Vapour Deposition", Materials Science Forum, Vols. 166-169, pp. 313-318, 1994
Online since
July 1994
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Price
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