Semiconductor Processing and Characterization with Lasers
Materials Science Forum Volumes 173 - 174
doi:10.4028/www.scientific.net/MSF.173-174
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p1
Femtosecond Time-Resolved Microscopy of Laser-Induced Morphology Changes
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380 K
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Authors: D. von der Linde
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p7
Low Temperature Deposition and Crystallization of Silicon by Means of Laser Techniques
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333 K
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Authors: Motohiro Hirose
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p17
Femtosecond-Pulse Laser Microstructuring of Semiconducting Materials
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428 K
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Authors: W. Kautek, Joachim Krüger
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p23
Modification of Foreign Atom Concentrations and Profiles in Silicon and Si1-x-y GexCy Alloys by Laser Chemical Etching
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327 K
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Authors: J. Boulmer, A. Desmur, B. Bourguignon, J.-B. Ozenne, R. Laval, A. Aliouchouche, D. Débarre, J.-P. Budin
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p29
Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation
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349 K
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Authors: I. Ulrych, K.M.A. El-Kader, V. Cháb, J. Kocka, P. Prikryl, V. Vydra, R. Cerný
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p35
Kinetics of Laser-Induced Synthesis and Crystallization of Thin Semiconductors Films
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202 K
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Authors: K. Kolev, L.D. Laude
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p41
Surface Patterning and Thin-Film Formation by Pulsed-Laser Ablation
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460 K
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Authors: D. Bäuerle, Enno Arenholz, J. Heitz, S. Proyer, E. Stangl, B. Luk'yanchuk
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p53
Laser Patterning of CuInSe2/Mo/SLS Structures for the Fabrication of CuInSe2 Sub Modules
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420 K
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Authors: L. Quercia, S. Avagliano, A. Parreta, E. Salza, P. Menna
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p59
UV-Excimer Laser Ablation Patterning of II-VI Compound Semiconductors
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524 K
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Authors: P.H. Key, D. Sands, F.X. Wagner
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p67
Fabrication and Characterisation of N+ Doped Laser Crystallised Polysilicon
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343 K
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Authors: E. Al-Nuaimy, J.M. Marshall, T.E. Dyer, A.R. Hepburn, J.F. Davies
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p73
Pulsed Laser Ablation: A Method for Deposition and Processing of Semiconductors at an Atomic Level
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432 K
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Authors: J.J. Dubowski
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p81
Vacuum Ultraviolet Deposition of Silicon Dielectrics
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485 K
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Authors: Ian W. Boyd
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p93
Conditions for Heterophase Junction Formation in Laser Deposited PbTe Films
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311 K
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Authors: V. Gaydarova
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p99
High-Quality Narrow-Gap Thin Films Produced by Quasi-Continuous-Wave IR-Laser-Assisted Evaporation
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212 K
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Authors: S.V. Plyatsko, Yu.S. Gromovoj
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p105
Laser-Induced Etching of Si Surfaces; the Effect of Weak Background Light
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102 K
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Authors: H. Grebel, T. Gayen