Laser-Induced Etching of Si Surfaces; the Effect of Weak Background Light |
| Journal |
Materials Science Forum (Volumes 173 - 174) |
| Volume |
Semiconductor Processing and Characterization with Lasers |
| Edited by |
M. Briege, H. Dittrich, M. Klose, H.W. Schock, J. Werner |
| Pages |
105-108 |
| DOI |
10.4028/www.scientific.net/MSF.173-174.105 |
| Citation |
H. Grebel et al., 1994, Materials Science Forum, 173-174, 105 |
| Authors |
H. Grebel, T. Gayen |
| Keywords |
Etching of Si Surfaces, Etching with Two Laser Frequencies, Laser Induced Etching |
| Full Paper |
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