Laser-Induced Etching of Si Surfaces; the Effect of Weak Background Light |
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| Journal | Materials Science Forum (Volumes 173 - 174) |
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| Volume | Semiconductor Processing and Characterization with Lasers |
| Edited by | M. Briege, H. Dittrich, M. Klose, H.W. Schock, J. Werner |
| Pages | 105-108 |
| DOI | 10.4028/www.scientific.net/MSF.173-174.105 |
| Authors | H. Grebel, T. Gayen |
| Keywords | Etching of Si Surfaces, Etching with Two Laser Frequencies, Laser Induced Etching |
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