Paper Title:
Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 173-174)
Edited by
M. Briege, H. Dittrich, M. Klose, H.W. Schock, J. Werner
Pages
29-34
DOI
10.4028/www.scientific.net/MSF.173-174.29
Citation
I. Ulrych, K.M.A. El-Kader, V. Cháb, J. Kocka, P. Prikryl, V. Vydra, R. Cerný, "Properties of Recrystallized Amorphous Silicon Prepared by XeCl Excimer Laser Irradiation", Materials Science Forum, Vols. 173-174, pp. 29-34, 1995
Online since
September 1994
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Price
$32.00
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