Paper Title:
Pulsed Laser Ablation: A Method for Deposition and Processing of Semiconductors at an Atomic Level
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Periodical
Materials Science Forum (Volumes 173-174)
Edited by
M. Briege, H. Dittrich, M. Klose, H.W. Schock, J. Werner
Pages
73-80
DOI
10.4028/www.scientific.net/MSF.173-174.73
Citation
J.J. Dubowski, "Pulsed Laser Ablation: A Method for Deposition and Processing of Semiconductors at an Atomic Level", Materials Science Forum, Vols. 173-174, pp. 73-80, 1995
Online since
September 1994
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