Vacuum Ultraviolet Deposition of Silicon Dielectrics |
| Journal |
Materials Science Forum (Volumes 173 - 174) |
| Volume |
Semiconductor Processing and Characterization with Lasers |
| Edited by |
M. Briege, H. Dittrich, M. Klose, H.W. Schock, J. Werner |
| Pages |
81-92 |
| DOI |
10.4028/www.scientific.net/MSF.173-174.81 |
| Citation |
Ian W. Boyd, 1994, Materials Science Forum, 173-174, 81 |
| Authors |
Ian W. Boyd |
| Keywords |
Dielectric, Excimer Lamp, Multilayer, Photochemistry, Photo-CVD, Photodeposition, Silicon Dioxide, Silicon Oxynitride, Thin Film, Ultraviolet, Vacuum Ultraviolet |
| Full Paper |
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