Paper Title:
Effect of Structure of Hydrogenated SiNx:H Films on the Dissociation Mechanism of Si-H and N-H Bonds
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 185-188)
Edited by
K.E. Heusler
Pages
119-128
DOI
10.4028/www.scientific.net/MSF.185-188.119
Citation
E.B. Gorokhov, A.G. Noskov, V.V. Vasilyev, E.M. Trukhan, V.N. Ovsyuk, G.Y. Salieva, "Effect of Structure of Hydrogenated SiNx:H Films on the Dissociation Mechanism of Si-H and N-H Bonds", Materials Science Forum, Vols. 185-188, pp. 119-128, 1995
Online since
March 1995
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