Paper Title:
Anomalous Diffusion of Phosphorus in Silicon by Pair Diffusion Model and Decrease in Quasi Vacancy Formation Energy
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Periodical
Materials Science Forum (Volumes 196-201)
Edited by
M. Suezawa and H. Katayama-Yoshida
Pages
1595-1600
DOI
10.4028/www.scientific.net/MSF.196-201.1595
Citation
M. Yoshida, "Anomalous Diffusion of Phosphorus in Silicon by Pair Diffusion Model and Decrease in Quasi Vacancy Formation Energy", Materials Science Forum, Vols. 196-201, pp. 1595-1600, 1995
Online since
November 1995
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Price
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