Paper Title:
Influence of Simultaneously Implanted As+ Ions on Diffusivity and Activation Efficiency of B Atoms Implanted into Silicon
  Abstract

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Periodical
Materials Science Forum (Volumes 196-201)
Edited by
M. Suezawa and H. Katayama-Yoshida
Pages
1637-1642
DOI
10.4028/www.scientific.net/MSF.196-201.1637
Citation
K. Yokota, T. Nakamura, F. Miyashita, K. Hirai, H. Takano, M. Kumagai, Y. Ando, K. Matsuda, "Influence of Simultaneously Implanted As+ Ions on Diffusivity and Activation Efficiency of B Atoms Implanted into Silicon", Materials Science Forum, Vols. 196-201, pp. 1637-1642, 1995
Online since
November 1995
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Price
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