Precipitates in Antimony Implanted Silicon |
| Journal |
Materials Science Forum (Volumes 196 - 201) |
| Volume |
Defects in Semiconductors 18 |
| Edited by |
M. Suezawa and H. Katayama-Yoshida |
| Pages |
1871-1874 |
| DOI |
10.4028/www.scientific.net/MSF.196-201.1871 |
| Citation |
Yoshio Kikuchi et al., 1995, Materials Science Forum, 196-201, 1871 |
| Authors |
Yoshio Kikuchi, F. Uesugi, S. Kaszczyszyn, Masataka Kase, M. Yoshida, K. Watanabe, I. Hashimoto |
| Keywords |
Antimony, Implantation, Precipitation, Silicon, TEM |
| Full Paper |
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