Paper Title:
Relaxation-Induced Deep Levels in SiGe/Si Heteroepitaxial Films
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 196-201)
Edited by
M. Suezawa and H. Katayama-Yoshida
Pages
365-370
DOI
10.4028/www.scientific.net/MSF.196-201.365
Citation
Y. Mera, K. Maeda, Y. Shiraki, "Relaxation-Induced Deep Levels in SiGe/Si Heteroepitaxial Films", Materials Science Forum, Vols. 196-201, pp. 365-370, 1995
Online since
November 1995
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Price
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