Photoluminescence and Electron-Spin-Resonance Studies of Defects in Ion-Implanted Thermal SiO2 Films |
| Journal |
Materials Science Forum (Volumes 196 - 201) |
| Volume |
Defects in Semiconductors 18 |
| Edited by |
M. Suezawa and H. Katayama-Yoshida |
| Pages |
97-102 |
| DOI |
10.4028/www.scientific.net/MSF.196-201.97 |
| Citation |
Hironobu Nishikawa et al., 1995, Materials Science Forum, 196-201, 97 |
| Authors |
Hironobu Nishikawa, Hisao Fukui, Eiji Watanabe, D. Ito, M. Takiyama, A. Ieki, Y. Ohki |
| Keywords |
Electron Spin Resonance, Ion-Implantation, Photoluminescence (PL), Thermal SiO2 Film |
| Full Paper |
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