Paper Title:
Growth of Si:H Thin Films by Hot Filament CVD: μ-Crystalline to Amorphous Transition
  Abstract

  Info
Periodical
Edited by
A.M. Mancini, C. Paorici and M.L. Terranova
Pages
167-172
DOI
10.4028/www.scientific.net/MSF.203.167
Citation
R. Polini, V. Barbarossa, C. Minarini, A. Eray, A. Marucci, G. Mattei, "Growth of Si:H Thin Films by Hot Filament CVD: μ-Crystalline to Amorphous Transition", Materials Science Forum, Vol. 203, pp. 167-172, 1996
Online since
February 1996
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