Paper Title:
Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus
  Abstract

  Info
Periodical
Edited by
A.M. Mancini, C. Paorici and M.L. Terranova
Pages
85-90
DOI
10.4028/www.scientific.net/MSF.203.85
Citation
G. Bruno, M. Losurdo, P. Capezzuto, V. Capozzi, F.G. Lorusso, A. Minafra, "Epitaxial Growth and Processing of InP Films in a 'Novel' Remote Plasma-MOCVD Apparatus", Materials Science Forum, Vol. 203, pp. 85-90, 1996
Online since
February 1996
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