Paper Title:
Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 215-216)
Edited by
A. Roósz and M. Rettenmayr
Pages
323-330
DOI
10.4028/www.scientific.net/MSF.215-216.323
Citation
W. Wołczyński, B. Billia, K. Rabczak, "Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient", Materials Science Forum, Vols. 215-216, pp. 323-330, 1996
Online since
June 1996
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Price
$32.00
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