Paper Title:
Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition
  Abstract

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Periodical
Materials Science Forum (Volumes 248-249)
Edited by
A.G. Balogh and G. Walter
Pages
167-170
DOI
10.4028/www.scientific.net/MSF.248-249.167
Citation
I.S. Tashlykov, V. Vishnyakov, A. Wirth, "Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition", Materials Science Forum, Vols. 248-249, pp. 167-170, 1997
Online since
May 1997
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