Paper Title:
Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry
  Abstract

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Periodical
Materials Science Forum (Volumes 248-249)
Edited by
A.G. Balogh and G. Walter
Pages
229-232
DOI
10.4028/www.scientific.net/MSF.248-249.229
Citation
T. Lohner, N.Q. Khánh, P. Petrik, M. Fried, E. Kótai, J. Gyulai , "Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry", Materials Science Forum, Vols. 248-249, pp. 229-232, 1997
Online since
May 1997
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