Paper Title:
Defect Formation by Low Energy Ions during Sputter Deposition of TiW and Au on Epitaxially Grown n-Si at Different Plasma Pressures
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 248-249)
Edited by
A.G. Balogh and G. Walter
Pages
249-252
DOI
10.4028/www.scientific.net/MSF.248-249.249
Citation
P. N.K. Deenapanray, F. D. Auret, G. Myburg, M. Hayes, W.E. Meyer, C. Schutte, "Defect Formation by Low Energy Ions during Sputter Deposition of TiW and Au on Epitaxially Grown n-Si at Different Plasma Pressures", Materials Science Forum, Vols. 248-249, pp. 249-252, 1997
Online since
May 1997
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.