Modeling of Ion Implantation and Diffusion in Si |
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| Journal | Materials Science Forum (Volumes 248 - 249) |
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| Volume | Materials Science Applications of Ion Beam Techniques |
| Edited by | A.G. Balogh and G. Walter |
| Pages | 41-48 |
| DOI | 10.4028/www.scientific.net/MSF.248-249.41 |
| Citation | M.-J. Caturla et al., 1997, Materials Science Forum, 248-249, 41 |
| Authors | M.-J. Caturla, T. Diaz de la Rubia, P.J. Bedrossian |
| Keywords | Diffusion, Ion-Implantation, Molecular Dynamics (MD), Monte-Carlo |
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