Paper Title:
Modeling of Ion Implantation and Diffusion in Si
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 248-249)
Edited by
A.G. Balogh and G. Walter
Pages
41-48
DOI
10.4028/www.scientific.net/MSF.248-249.41
Citation
M.-J. Caturla, T. Diaz de la Rubia, P.J. Bedrossian, "Modeling of Ion Implantation and Diffusion in Si", Materials Science Forum, Vols. 248-249, pp. 41-48, 1997
Online since
May 1997
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