Paper Title:
Relaxation Behavior of Poly(methylphenylsilylenemethylene) at Low Temperature Studied by Positron Annihilation
  Abstract

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Periodical
Materials Science Forum (Volumes 255-257)
Edited by
Y. C. Jean, Morten Eldrup, David M. Schrader, Roy N. West
Pages
351-353
DOI
10.4028/www.scientific.net/MSF.255-257.351
Citation
T. Suzuki, N. Oshima, E. Hamada, T. Ogawa, M. Murakami, Y. Ito, "Relaxation Behavior of Poly(methylphenylsilylenemethylene) at Low Temperature Studied by Positron Annihilation", Materials Science Forum, Vols. 255-257, pp. 351-353, 1997
Online since
September 1997
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